Underpotential deposition of Cobalt onto polycrystalline platinum. Journal of Solid State Electrochemistry. L.H. Mendoza-Huizar, C.H. Rios-Reyes. DOI: 10.1007/s10008-010-1146-1
An electrochemical study of cobalt electrodeposition onto a polycrystalline platinum electrode from an aqueous solution (10?2 M CoCl2?+?1 M NH4Cl (pH 9.5)) was carried out through cyclic voltammetry and potential step techniques. Analysis of the voltammetric data clearly showed that a cobalt adlayer is formed during the application of potential in the underpotential deposition (upd) region. Formation of this cobalt adlayer involved the simultaneous presence of both adsorption and 2D nucleation processes. Cobalt adlayers obtained by linear voltammetry in upd region were analyzed employing diffuse reflectance spectroscopy (DRS). By using theoretical quantum studies at PM6//HF/LANL1MB level, it was possible to assign the peaks obtained by DRS at 328 and 337 nm to the cobalt adsorption on Pt(111) and Pt(100), respectively, while the signals recorded at 355 and 362 nm were related with the clean platinum surfaces Pt(100) and Pt(111). Also, quantum calculations at the PM6 level indicated that the energy formation order is Co-Pt(100)?>?Co-Pt(111)?>?Co-Pt(110)?>?Co-Co(surface).